Descripción:
Bellingham, WA, U.S.A.: SPIE PRESS-The International Society for Optical Engineering, 1989. Ex-Library. Very Good. Paperback. 1st.. 4to - over 9¾ - 12" tall. Seller's image, know what you are getting! ORIGINAL, NOT A REPRINT OR PHOTOCOPY!! NO Dust Jacket. Has or May Have all standard Library markings, pocket, labels, stamps, wear and soil to covers. CLEAN TEXT! See Picture! The Copyright date is 1989 for this Printing. Thank you for your purchase from Sunset Books! Help Promote World Literacy, GIVE a Book as a GIFT!! In stock, Ships from Ohio. WE COMBINE SHIPPING ON MULTIPLE PURCHASES!!!! SEE PICTURES!!!!! ANY ODD/GREEN TONES ON THE SCANS ARE CAUSED BY MY SCANNER!! All of our Technical/Textbook/Ex-Library volumes were obtained legally through Public or Auction sales. Size: 4to.
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Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII : 1-3 March 1989, San Jose, California (Proceedings of Spie) Unknown - 1989
de n/a
Detalles
- Título Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII : 1-3 March 1989, San Jose, California (Proceedings of Spie)
- Autor n/a
- Encuadernación unknown
- Edición 1st
- Editorial Society of Photo Optical, Bellingham, WA, U.S.A.
- Fecha de publicación 1989-07
- ISBN 9780819401243
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Electron-Bean, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII: Volume 1089. Proceedings of SPIE; 1-3 March 1989, San Jose, California
de Yanof, Arnold W. (Editor)
- Usado
- very good
- Tapa blanda
- First
- Estado
- Usado - Very Good
- Edición
- 1st.
- Encuadernación
- Paperback
- ISBN 10 / ISBN 13
- 9780819401243 / 0819401242
- Cantidad disponible
- 1
- Librería
-
NEWARK, Ohio, United States
- Precio
-
EUR 25.37EUR 5.17 enviando a USA
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Precio
EUR 25.37
EUR 5.17
enviando a USA
